Pulsed - laser deposition of superconducting Nd1. 85Ce0.15Cu4−δ thin films and their structural examinations
Abstract: Thin films of
electron - doped superconducting Nd1.85Ce0.15CuO4−δ have been deposited on
(100) SrTiO3 substrates at 680 - 840◦ C using pulsed - laser deposition. The
deposition process was conducted in flowing oxygen with the rate of 25 ml/min
and the pressure of 0.25 mbar. The in-situ post-annealing treatments in vacuum
(down to 10− 7 mbar) for several minutes at deposition and/or lower
temperatures were given to induce superconductivity on the films. The best quality
of films with Tc of about 20 K, smooth surface, nanometer-sized grains and
average roughness of 3.5 nm have been produced by the growing film at 820◦ C
followed by annealing at 750◦ C in vacuum for 5 minutes.
Author: Ariando, and Darminto
Journal Code: jpfisikagg050002
