SIFAT OPTIK DAN ENERGI GAP FILM FERROELEKTRIK LITASIO5 DI ATAS SUBSTRAT SILIKON
ABSTRACT: Lithium tantalate
silicate (LiTaSiO5) has successfully been made on Si (100) p-type and Si (111)
n-type by chemical solution deposition (CSD) technique with temperatures
variation of 600, 650, 700, 750, and 800 oC. Determined the film thickness as
well as and test the optical properties with UV-Vis spectroscopy. The maximum
absorbance of the substrates were 420 and 980 nm. The maximum band of films on
Si (100) was 2.94 eV a temperature of 650 oC and Si (111) was 3.06 eV a
temperature of 800 oC
Penulis: La Isa, Irmansyah, Irzaman
Kode Jurnal: jppertaniandd160550
