ELECTRICAL AND OPTICAL PROPERTIES OF ZnO THIN FILMS GROWN BY R.F. MAGNETRON SPUTTERING FOR SOLAR CELL APPLICATION
ABSTRACT: Pyramidal textured,
good electrical and optical properties of thin films ZnO has been successfully
grown by R.F. Magnetron sputtering at low temperature. The grain size of the
textured surface is highly dependent on growth condition, especially the
special speciments introduced to the system. The pressure was adjusted by
flowing the high purity Ar gas into the
chamber. The best textured films were obtained by mixing methanol at pressure
equal or lower than 15 mTorr. The film thickness are varies from 1μm to 2.5 μm, and having an
average total transmittance of 92 - 86 % on the range of 400 to 800 nm
wavelength. The films resistivities is lower than 1.5 x 10-3 Ωcm, while the haze
factor of the best film is about 14.1 %. From XRD measurements, it shows that
the textured surface showing four peaks on the direction of (110), (002), (101)
and (112), while the non-textured films only show peaks on the direction of
(110) and (002).
Author: Masno Ginting
Journal Code: jpfisikagg100009