ELECTRICAL AND OPTICAL PROPERTIES OF ZnO THIN FILMS GROWN BY R.F. MAGNETRON SPUTTERING FOR SOLAR CELL APPLICATION

ABSTRACT: Pyramidal textured, good electrical and optical properties of thin films ZnO has been successfully grown by R.F. Magnetron sputtering at low temperature. The grain size of the textured surface is highly dependent on growth condition, especially the special speciments introduced to the system. The pressure was adjusted by flowing the  high purity Ar gas into the chamber. The best textured films were obtained by mixing methanol at pressure equal or lower than 15 mTorr. The film thickness  are varies from 1μm to 2.5 μm, and having an average total transmittance of 92 - 86 % on the range of 400 to 800 nm wavelength. The films resistivities is lower than 1.5 x 10-3 Ωcm, while the haze factor of the best film is about 14.1 %. From XRD measurements, it shows that the textured surface showing four peaks on the direction of (110), (002), (101) and (112), while the non-textured films only show peaks on the direction of (110) and (002). 
Keywords:  ZnO, electrical and optical properties, thin film, R.F. Magnetron Sputtering
Author: Masno Ginting
Journal Code: jpfisikagg100009

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